Jin Zuqing  Chang Ming  Xu Shoulian 

(The Mechanical & Electrical College under Tianjin University)

Liu Xianghuai  Zheng Shihong

(Shanghai Institute of Metallurgy)

Abstract: TEM, SEM and x-ray have been used to investigate the microstructures of the silicon nitride film by Ion Beam Enhanced Deposition (IBED) on surface of 1 Cr18Ni9Ti. Observation reveals that Si3N4 is the amorphous structure and have been a little dispersed single crystal phase β–Si3N4 in the film. The physiognomy of Si3N4, interface shape of Si3N4/1Cr18Ni8Ti and the factors influence on the formation were discussed gualilatively in the paper.
Key words: 离子束 沉积 显微组织
Received 198907, received in revised form 199003