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Abstract: Rapid precision manufacturing for 0.1 µm or finer feature
sizes lithography in integrated circuit or micro electro mechanical
systems precision manufacturing is discussed. This technique avoids the
conflict between lithography speed and feather size. As same as
electron-beam lithography and imprint lithography, it not only has the
same ability of nano-meter manufacturing, but also overcomes their
shortcomings. At last, it can make low cost and precise manufacturing on
large area at high speed.
Key words: IC MEMS Rapid reputation Lithography
CLC No: TP242
国家自然科学基金(50275118)和国家863计划(2002AA420050)重点资助项目. Received 20020304,
received in revised form 20030120
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