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  HomeContents of Chinese Journal of Mechanical Engineering 2005 No.11FABRICATION OF PDMS MICROFLUIDIC CHIP BY WET ETCHING SILICON

FABRICATION OF PDMS MICROFLUIDIC

CHIP BY WET ETCHING SILICON

 

Zhang Feng  Zhang Hongyi  Zhou Yongliang

(College of Chemistry and Chemical Engineering, Xiamen University, Xiamen 361005)

Yang Wei   Chen Binbin

(Pen-Tung Sah MEMS Research Center, Xiamen University, Xiamen 361005)

 

Abstract: A method is developed to fabricate polydimethylsiloxane (PDMS) microfluidic chip. After making the casting mould by anisotropy etching silicon(100) with 15% (CH3)4NOH, PDMS microfluidic chip can be get by casting and middle vacuum bonding. All procedures are finished in about 10 h. The whole process is monitored by SEM or confocal microscope. The relative standard deviation of micropatterns of the silicon mold and PDMS microfuidic chip are under 3% and 1%, the smoothness is 0.051 μm and 0.183 μm respectively. Electrophoresis separation is carried out on the fabricated PDMS microfluidic chip. Been applied 200 V/cm electric field, the mixture of TPPS and TCPcCo(Ⅱ) is successfully separated within 30 s in 4.7 cm long channel.

Key words: Microfluidic chip  Fabrication  Wet etching   Silicon(100)  Polydimethylsiloxane (PDMS)

CLC No: TN405  O657

福建省科技重点资助项目(2003H86). Received 20040921, received in revised form 20050510

 

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